Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2005-02-01
2005-02-01
Niebling, John F. (Department: 2812)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S244000, C438S250000, C438S253000, C438S386000, C438S393000, C438S396000, C438S682000, C438S664000, C438S683000
Reexamination Certificate
active
06849495
ABSTRACT:
A memory device and method of manufacturing thereof, wherein a silicide material is selectively formed over active regions of a memory device. A silicide material may also be formed on the top surface of wordlines adjacent the active regions during the selective silicidation process. A single nitride insulating layer is used, and portions of the workpiece are covered with photoresist during the formation of the silicide material.
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Commons Martin
Fayaz Mohammed Fazil
Wensley Paul
Infineon - Technologies AG
Kennedy Jennifer M.
Niebling John F.
Slater & Matsil L.L.P.
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