Selective silicidation scheme for memory devices

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C438S244000, C438S250000, C438S253000, C438S386000, C438S393000, C438S396000, C438S682000, C438S664000, C438S683000

Reexamination Certificate

active

06849495

ABSTRACT:
A memory device and method of manufacturing thereof, wherein a silicide material is selectively formed over active regions of a memory device. A silicide material may also be formed on the top surface of wordlines adjacent the active regions during the selective silicidation process. A single nitride insulating layer is used, and portions of the workpiece are covered with photoresist during the formation of the silicide material.

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