Selected trihydroxybenzophenone compounds and their use in photo

Details Selected trihydroxybenzophenone compounds and their use in photo Selected trihydroxybenzophenone compounds and their use in photo

1992-09-14

1993-06-15

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430165, 430191, 430192, 430193, 430330, 534556, 534557, G03F 732, G03F 738, G03F 7023, C07C29100

Patent

active

052197140

ABSTRACT:
A process of developing an image-wise exposed photoresist-coated substrate comprising: coating a substrate with a positive working photoresist comprising an admixture of an alkali soluble binder resin and photoactive formula (V): ##STR1## wherein R.sub.2 is selected from the group consisting of an OD group, a halide group, a lower alkyl group having 1 or 4 carbon atoms and a lower alkoxy group having 1 to 4 carbon atoms, and D is selected from the group consisting of o-naphthoquinone diazide sulfonyl group and hydrogen; with the proviso that at least four D's are o-naphthoquinone diazide sulfonyl groups; subjecting the coating on the substrate to an image-wise exposure of radiation; and subjecting the image-wise coated substrate to a developing solution to remove the exposed areas of the radiation-exposed coating, leaving a positive image pattern.

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U.S. Patent Application No. 07/200,676 (Medhat Toukhy, filed May 31, 1988).

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