Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1994-02-09
1994-08-16
Bowers, Jr., Charles J.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430165, 430191, 430192, 430193, G03F 730, G03F 7023
Patent
active
053386523
ABSTRACT:
A novolak resin composition comprising at least one unit of the reaction product of a para-, para-bonded bisphenol having formula (A): ##STR1## wherein R.sub.1 =hydrogen, lower alkyl group having 1-4 carbon atoms, halogen, or lower alkoxy group having 1-4 carbon atoms; wherein
REFERENCES:
patent: 5128230 (1992-07-01), Templeton et al.
Honda et al. "Studies of Dissolution Inhibition Mechanism of DNQ-Novolak Resist [II] Effect of Extended Ortho-Ortho Bond in Novalak", SPIE vol. 1466 Advances in Resist Technology & Processing VIII (1991) pp. 141 et seq.
Sarubbi Thomas R.
Sizensky Joseph J.
Bowers, Jr. Charles J.
Chu John S.
OCG Microelectronic Marterials, Inc.
Simons William A.
LandOfFree
Selected structurally defined novolak binder resins and their us does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Selected structurally defined novolak binder resins and their us, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Selected structurally defined novolak binder resins and their us will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-951295