Secondary ion mass spectrometer with aperture mask

Details Secondary ion mass spectrometer with aperture mask Secondary ion mass spectrometer with aperture mask

1998-06-09

2000-06-27

Nguyen, Kiet T.

Radiant energy

Inspection of solids or liquids by charged particles

Positive ion probe or microscope type

250307, 250306, H01J 4926

Patent

active

060809868

ABSTRACT:
In a secondary ion mass spectrometer an aperture mask (3), which is not part of the secondary ion optics (5) of the spectrometer, is arranged very near to the surface of a specimen (1) to be analyzed, for example a semiconductor. The primary and secondary ions pass through the aperture (3A) in the aperture mask (3). The position of the specimen relative to the aperture mask dictates the location on the specimen (1) to be analyzed. The outer dimension of the mask is larger than the field of view of the secondary ion optics (5). Due to the masked region the fringe areas of the specimen are shielded ionoptically so that they cannot result in any falsification of the electric field. An electrical dc or ac potential can be applied to the mask (3) so that the electric field between the aperture (3A) and the specimen (1) can be additionally influenced. A contact device (3B) can be applied between the mask (3) and the specimen (1) for preventing electrical charging of the specimen (1).

REFERENCES:
patent: 4611120 (1986-09-01), Bancroft et al.
patent: 4748325 (1988-05-01), Slodzian
patent: 4992661 (1991-02-01), Tamura et al.
patent: 5350919 (1994-09-01), Hirano et al.
Manfred Grasserbauer; Secondary Ion Mass Spectrometry; (1994); ol. 28; p. 222-232.
H. Bolouri and J S Colligan; A simple efficient SIMS apparatus for use on accelerator beam lines; (1982); vol. 32; p. 293-295.
Helmut Liebl; Optimum Sample Utilization In Secondary Ion Mass Spectrometry; (1981); p. 183-188; North-Holand Publishing Co.
Helmut Liebl; Combined Electrostatic Objective And Emission Lenses For Microcharacterization Of Surfaces; (1983); p. 511-514; Elsevier Scientific Publishing Company, Amsterdam.

Affiliated with

Also associated with

Rating

Secondary ion mass spectrometer with aperture mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Secondary ion mass spectrometer with aperture mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Secondary ion mass spectrometer with aperture mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1786469