Secondary ion mass analyzing apparatus

Radiant energy – Inspection of solids or liquids by charged particles – Positive ion probe or microscope type

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Details

250299, 250397, G01N 23225, H01J 37256

Patent

active

050862278

ABSTRACT:
A secondary ion mass analyzing apparatus is suitable for a depth directional analysis of a specimen. The apparatus includes means for forming an image of said secondary ions, an aperture disposed on a position in which the secondary ion image is formed, means for detecting the secondary ions which have passed through the aperture and for converting the detected ions into electrical signals, and means for displaying an image of said aperture based on the electrical signals. In such a manner, the aperture is disposed on the secondary ion image forming position. The image of the aperture is displayed on the image displaying apparatus by using the secondary ions which have passed through the aperture. If the ion image is not formed on the position of the aperture, the contour of the aperture image would be unclear while if the ion image is formed on the position of the aperture, the contour of the aperture image would be clear. Accordingly, by monitoring the clearness of the aperture image, focusing of the ion image upon the aperture position may be determined. Therefore, the secondary ions which have generated from the specimen corresponding to a portion other than the central portion of the primary ion beam can be prevented from being introduced to a mass analyzing portion. A depth directional analysis of the specimen can be accomplished at a high accuracy.

REFERENCES:
patent: 5008537 (1991-04-01), Toita et al.
Tamura et al., Proc. 6th Chateunl, Vacuum Congr, 1974, pp. 379-382.

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