Sealing method for electronic devices formed on a common...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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Reexamination Certificate

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07078294

ABSTRACT:
A method for sealing electronic devices formed on a semiconductor substrate includes forming at least one first conductive layer on a first portion of the semiconductor substrate for defining electronic devices, and forming a second conductive layer on a second portion of semiconductor substrate for also defining electronic devices. First regions are formed in the at least one first conductive layer for defining electronic devices, and a first sealing layer is formed on the whole semiconductor substrate to seal the first regions. Second regions are formed in the second conductive layer for defining electronic devices, and a second sealing layer is formed on the whole semiconductor substrate to seal the second regions.

REFERENCES:
patent: 6468867 (2002-10-01), Lai et al.
patent: 6506647 (2003-01-01), Kuroda et al.
patent: 6630378 (2003-10-01), Tanigawa
patent: 6798002 (2004-09-01), Ogle et al.
patent: 2003/0151069 (2003-08-01), Sugimae et al.
Patent Abstracts of Japan, vol. 1996, No. 10, Oct. 31, 1996 & JP 08 153860 A, Mitsubishi Electric Corp., Jun. 11, 1996.

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