Sealed polishing pad, system and methods

Details Sealed polishing pad, system and methods Sealed polishing pad, system and methods

2007-05-01

2007-05-01

Ackun, Jr., Jacob K. (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

By optical sensor

C451S526000

Reexamination Certificate

active

11213623

ABSTRACT:
A polishing pad, polishing system, method of making a polishing pad and method of using a polishing pad. The polishing pad includes a polishing layer having a polishing surface, a backing layer with an aperture and a first portion that is permeable to liquid, and a sealant that penetrates a second portion of the backing layer adjacent to and surrounding the aperture such that the second portion is substantially impermeable to liquid. The aperture is positioned below a substantially fluid-impermeable element.

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U.S. Appl. No. 11/124,420, filed May 6, 2005.
U.S. Appl. No. 11/213,674, filed Aug. 26, 2005.

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