Scrubbing equipment for a semiconductor device using laser dista

Cleaning and liquid contact with solids – Apparatus – Automatic controls

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Details

134153, 134902, 15 77, 15 882, 15 883, B08B 302

Patent

active

059471344

ABSTRACT:
Scrubbing equipment for semiconductor devices includes an automatic brush-height adjustment device for automatically adjusting the height of a brush over a wafer surface so that eddy currents are produced in a layer of water on the wafer and minute particles are cleaned from the wafer without damaging the wafer surface. The brush-height adjustment device uses a distance sensor which measures the distance between the tip of the brush and the top of the wafer using laser pulses and then controls up-and-down movement of the shaft upon which the brush is mounted based upon that distance.

REFERENCES:
patent: 5475889 (1995-12-01), Thrasher et al.
patent: 5636401 (1997-06-01), Yonemizu et al.
patent: 5647083 (1997-07-01), Sugimoto et al.
patent: 5829087 (1998-11-01), Nishimura et al.

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