Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-06-05
1997-11-25
Breneman, R. Bruce
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419212, 20429811, 156345, 118715, 118504, 118720, 118721, C23C 1434, C23C 1600, C23F 102
Patent
active
056907958
ABSTRACT:
A structure and method is described for securing an overspray shield in processing chambers in the wall sandwich of the chamber or using a dimensionally compliant floating spacer ring to elastically clamp the overspray shield in position in a vacuum substrate processing chamber without the use of removable fasteners. The configuration uses the differential pressures between the inside and outside of the chamber to clamp the overspray shield along with its shield clamping assembly components at a spacer position in the chamber. The spacer position is generally interior to vacuum sealing limits of the chamber. The arrangement is such that if misalignment occurs a good vacuum-type seal cannot be achieved unless the parts are moved to correct alignment. When correctly aligned the overspray shield is tightly held to the processing chamber wall and electrical continuity between the processing chamber wall and the overspray shield is assured throughout expected process conditions.
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European Search Report dated Sep. 23, 1996, for European Patent Application Number 96304056.3.
Brodsky Stephen Bruce
Grunes Howard
Rosenstein Michael
Applied Materials Inc.
Biksa Janis
Breneman R. Bruce
International Business Machines - Corporation
McDonald Rodney G.
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