Radiant energy – Inspection of solids or liquids by charged particles
Reexamination Certificate
2005-09-30
2008-09-30
Berman, Jack I. (Department: 2881)
Radiant energy
Inspection of solids or liquids by charged particles
C073S105000, C977S849000, C977S850000, C977S851000, C977S854000
Reexamination Certificate
active
07429732
ABSTRACT:
The preferred embodiments are directed to a method and apparatus of operating a scanning probe microscope (SPM) to perform sample measurements using a survey scan that is less than five lines, and more preferably two lines, to accurately locate a field of features of a sample. This is accomplished by selecting a step distance between adjacent lines of the survey scan that does not equal the pitch of the features in a direction orthogonal to the direction the survey scan traverses, i.e., does not equal the pitch of the features in the scan direction, XPO. The aspect ratio of the scans can also be modified to further improve sample throughput.
REFERENCES:
patent: 4954704 (1990-09-01), Elings et al.
patent: 5204531 (1993-04-01), Elings et al.
patent: 5266801 (1993-11-01), Elings et al.
patent: RE34489 (1993-12-01), Hansma et al.
patent: 5283442 (1994-02-01), Martin et al.
patent: 5298975 (1994-03-01), Khoury et al.
patent: 5412980 (1995-05-01), Elings et al.
patent: 5825670 (1998-10-01), Chernoff et al.
patent: 6267005 (2001-07-01), Samsavar et al.
patent: 6714892 (2004-03-01), Houge et al.
patent: 6715346 (2004-04-01), Shuman
patent: 6986280 (2006-01-01), Muckenhirm
patent: 7053369 (2006-05-01), Roessler et al.
patent: 7323657 (2008-01-01), Cheng
patent: 2004/0031315 (2004-02-01), Shuman
Moloni, et al. “Stylus nanoprofilometry for mask metrology” in Microlithography World, Aug. 2004.
Jain Rohit
Klonowski Matthew T.
Kneeburg David A.
Osborne Jason R.
Schmitz Ingo
Berman Jack I.
Boyle Fredrickson , S.C.
Maskell Michael
Veeco Instruments Inc.
LandOfFree
Scanning probe microscopy method and apparatus utilizing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Scanning probe microscopy method and apparatus utilizing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Scanning probe microscopy method and apparatus utilizing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3980548