Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1992-06-23
1993-05-04
Mis, David
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511121, 20429816, 20429837, 20429838, C23C 1422, H05H 146
Patent
active
052085120
ABSTRACT:
Electron cyclotron apparatus is described in which the locus of cyclotron resonance is scanned away from and toward the axis of a magnetic field by varying the strength of the magnetic field, the frequency of electromagnetic waves passing along its axis, or both.
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IBM Technical Disclosure Bulletin; W. C. Ko and M. F. Uman; vol. 18 No. 11; Apr. 1976; pp. 3662-3663.
Forster John C.
Holber William M.
Logan Joseph S.
International Business Machines - Corporation
Mis David
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