Active solid-state devices (e.g. – transistors – solid-state diode – Mosfet type gate sidewall insulating spacer
Reexamination Certificate
2006-05-09
2006-05-09
Tran, Mai-Huong (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Mosfet type gate sidewall insulating spacer
C257S331000, C257S903000, C257S904000, C438S240000, C438S258000, C365S063000
Reexamination Certificate
active
07042107
ABSTRACT:
A memory device includes a semiconductor substrate, a first gate insulator on a first portion of a semiconductor substrate, a storage node on the first gate insulator, a tunnel junction barrier on the storage node and a data electrode on the layer tunnel junction barrier. The device further includes a second gate insulator layer on a sidewall of the tunnel junction barrier, a third gate insulator on a second portion of the substrate adjacent the tunnel junction barrier and a gate electrode on the second gate insulator and the third gate insulator. First and second impurity-doped regions are disposed in the substrate and are coupled by a channel through the first and second portions of the substrate. Fabrication of such a device is also describes.
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Myers Bigel & Sibley Sajovec, PA
Samsung Electronics Co,. Ltd.
Tran Mai-Huong
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