Sandwich photoresist structure in photolithographic process

Details Sandwich photoresist structure in photolithographic process Sandwich photoresist structure in photolithographic process

2005-01-18

2005-01-18

Duda, Kathleen (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S312000, C430S394000, C430S950000

Reexamination Certificate

active

06844143

ABSTRACT:
A photolithographic process that involves building a sandwich photoresist structure. A first photoresist layer is formed over a substrate. An anti-reflection layer is formed over the first photoresist layer. A second photoresist layer is formed over the anti-reflection layer. A first photo-exposure is conducted and the exposed second photoresist layer is developed to pattern the second photoresist layer and the anti-reflection layer. Using the second photoresist layer and the anti-reflection layer as a mask, a second photo-exposure and a second photoresist development are conducted to pattern the first photoresist layer.

REFERENCES:
patent: 5882996 (1999-03-01), Dai
patent: 6004722 (1999-12-01), Zhang et al.

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