Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1997-06-12
1998-07-21
Nguyen, Kiet T.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
25044211, H01J 3720
Patent
active
057838305
ABSTRACT:
A sample evaluation/process observation system includes a common sample stage which accommodates a plurality of samples to be processed. The common sample stage is provided with a processing/observing notch and also with a movement mechanism. The movement mechanism functions to sequentially move the plurality of samples to the notch to cause the samples to be exposed to a predetermined processing beam and observing beam. The system further includes a beam processing device in which the common sample stage can be mounted and which functions to irradiate the predetermined processing beam on the plurality of samples through the notch to thereby sequentially perform beam processing operation over the samples. The system further includes a beam observation device in which the common sample stage can be mounted and which functions to irradiate the predetermined observing beam on the plurality of samples through the notch to sequentially observe and evaluate shapes of the plurality of samples. A mark is formed on one sample by a focused ion beam device so that positioning of the mark realizes automatic processing of a part of the sample to be processed. Further, the common sample stage is used in a high-acceleration transmission electron microscope and a high-acceleration scanning electron microscope and focused ion beam device.
REFERENCES:
patent: 3778621 (1973-12-01), Mikajiri
patent: 5089708 (1992-02-01), Asselbergs
Hirose Hiroshi
Ichihashi Mikio
Isakozawa Shigeto
Koike Hidemi
Sato Yuji
Hitachi , Ltd.
Nguyen Kiet T.
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