Sample analysis method

Details Sample analysis method Sample analysis method

2007-01-23

2007-01-23

Nguyen, Tu T. (Department: 2877)

Optics: measuring and testing

By polarized light examination

Of surface reflection

Reexamination Certificate

active

11089783

ABSTRACT:
A sample, in which a dielectric film having a dielectric constant equal to or larger than 50 (based on electrical measurement) is formed on a substrate, is measured by an ellipsometer while a model corresponding to the sample is formed based on effective medium approximation (EMA). A film corresponding to the dielectric film of the model includes void volume fraction between 60% and 90%. A calculated value based on the model is compared with a value measured by the ellipsometer and fitting is applied to decrease a difference between the compared values in order to specify the thickness and the optical constant of the sample.

REFERENCES:
patent: 4332833 (1982-06-01), Aspnes et al.
patent: 6808742 (2004-10-01), Rouse et al.
patent: 2002-340528 (2002-11-01), None
patent: 2002-340789 (2002-11-01), None

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