Salt suitable for an acid generator and a chemically...

Details Salt suitable for an acid generator and a chemically... Salt suitable for an acid generator and a chemically...

2008-07-22

2009-11-03

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S907000, C430S910000, C430S921000, C430S922000, C560S126000, C562S109000, C562S113000

Reexamination Certificate

active

07611822

ABSTRACT:
The present invention provides a salt represented by the formula (I):wherein Q1and Q2each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, T represents a methylene group or a carbonyl group, R represents an adamantyl group substituted with at least one selected from the group consisting of a C1-C4 alkyl group, a C1-C4 alkoxy group, a hydroxyl group, a hydroxymethyl group, a cyano group and an oxo group, and A+represents an organic counter ion.The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

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CAS Abstract Acc. No. 2008:1008950, Hagiwara et al. WO 2008/099869 published Aug. 21, 2008.

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