Salt suitable for an acid generator and a chemically...

Details Salt suitable for an acid generator and a chemically... Salt suitable for an acid generator and a chemically...

2007-08-10

2008-10-21

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S921000, C560S129000, C560S150000

Reexamination Certificate

active

07439006

ABSTRACT:
A salt represented by the formula (I):wherein X represents a C1-C12 divalent linear or branched chain hydrocarbon group, Y represents a C1-C30 hydrocarbon group which may be substituted with at least one substituent, and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —O— or —CO—, Q1and Q2each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+represents an organic counter ion.The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

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