Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2011-01-11
2011-01-11
Owens, Douglas W (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111510, C315S111710
Reexamination Certificate
active
07868556
ABSTRACT:
A RF matching network is described, and which includes a 1stto nth RF generators, and wherein each RF generator has a different frequency, and wherein the frequencies of the 1stto the nth RF input ports decline in sequence, and wherein between the ith frequency RF input port, and the output port is a ith circuit, which has a high impedance at the output port to all RF generator frequencies other than the ith frequency; and wherein the ith circuit, when connected to a RF generator with the ith frequency, and wherein measuring from the output port to the ith circuit, the ith circuit has a first impedance at the ith frequency; and when measuring from the output port in the opposite direction to the ith circuit, the ith circuit has a second impedance at the ith frequency; and wherein the first impedance is a substantial conjugate match of the second impedance.
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Advanced Micro-Fabrication Equipment, Inc. Asia
Bach, Esq. Joseph
Le Tung X
Nixon & Peabody LLP.
Owens Douglas W
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