Reversing orientation of sputtering screen to avoid contaminatio

Details Reversing orientation of sputtering screen to avoid contaminatio Reversing orientation of sputtering screen to avoid contaminatio

1994-12-16

1996-05-14

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429811, C23C 1434

Patent

active

055164030

ABSTRACT:
A sputtering apparatus deposits a layer of material on a substrate. The apparatus includes a screening member, such as a plate collimator or a tube collimator, located between the target and substrate. A motor drive reverses the respective positions of the two opposite sides of the screening device which respectively face the substrate and the target.

REFERENCES:
patent: 5223108 (1993-06-01), Hurwitt

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