Reticle design inspection system

Details Reticle design inspection system Reticle design inspection system

2006-07-18

2006-07-18

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

C356S237500, C250S559300, C355S055000, C382S144000

Reexamination Certificate

active

07079235

ABSTRACT:
A method of reticle inspection, comprising generating a test reticle comprising a plurality of test pattern-features thereon; manufacturing a wafer using the reticle; and determining a transfer of at least one of said plurality of pattern features from said reticle to said wafer. Preferably, a neural network is trained using the determination. Preferably, a reticle is inspected by running detected defects through the neural network to determine if the detected defect has a consequence.

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