Retaining ring with flange for chemical mechanical polishing

Abrading – Accessory

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C451S288000, C451S398000

Reexamination Certificate

active

07094139

ABSTRACT:
A retaining ring has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The outer diameter surface includes an outwardly projecting flange having a lower surface, and the bottom surface includes a plurality of channels.

REFERENCES:
patent: 5205082 (1993-04-01), Shendon et al.
patent: 5423558 (1995-06-01), Koeth et al.
patent: 5584751 (1996-12-01), Kobayashi et al.
patent: 5605488 (1997-02-01), Ohashi et al.
patent: 5635083 (1997-06-01), Breivogel et al.
patent: 5643053 (1997-07-01), Shendon
patent: 5643061 (1997-07-01), Jackson et al.
patent: 5645474 (1997-07-01), Kubo et al.
patent: 5647789 (1997-07-01), Kitta et al.
patent: 5695392 (1997-12-01), Kim
patent: 5759918 (1998-06-01), Hoshizaki et al.
patent: 5851140 (1998-12-01), Barns et al.
patent: 6089961 (2000-07-01), Cesna et al.
patent: 6143127 (2000-11-01), Perlov et al.
patent: 6224472 (2001-05-01), Lai et al.
patent: 6277008 (2001-08-01), Masuta et al.
patent: 6354927 (2002-03-01), Natalicio
patent: 6527624 (2003-03-01), Tolles et al.
patent: 6736713 (2004-05-01), Lougher et al.
patent: 2002/0173256 (2002-11-01), Suwabe
patent: 2004/0065412 (2004-04-01), Ensinger
patent: 2004/0067723 (2004-04-01), Ensinger
patent: 0 747 167 (1996-12-01), None
patent: 0 776 730 (1997-06-01), None
patent: 0 790 100 (1997-08-01), None
patent: 0 841 123 (1998-05-01), None
patent: 0 988 931 (2000-03-01), None
patent: 1038636 (2000-09-01), None
patent: 2 307 342 (1997-05-01), None
patent: 2 336 121 (1999-10-01), None
patent: 12-225556 (2000-08-01), None
patent: 195222 (1999-02-01), None
patent: 2000-18619 (2000-04-01), None
patent: 2002-84818 (2002-11-01), None
“High-Tech Resins Boost Chip Production”, Machine Design, Nov. 7, 1996, pp. 52+. [“Machine Design”].
“Advanced Engineering Plastics for Semiconductor Industry”, DSM Engineering (Polymer Corporation), 1996. [“DSM”].
“Advanced Engineering Plastics for the Semiconductor Industry”, DSM Engineering (Polymer Corporation), 1997. [“DSM”].

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Retaining ring with flange for chemical mechanical polishing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Retaining ring with flange for chemical mechanical polishing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Retaining ring with flange for chemical mechanical polishing will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3688387

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.