Resonant chamber applicator for remote plasma source

Details Resonant chamber applicator for remote plasma source Resonant chamber applicator for remote plasma source

1997-03-04

1999-05-11

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723MW, 156345, 31323131, C23C16/00

Patent

active

059024046

ABSTRACT:
A remote source of partially ionized plasma gas having ions and excited neutral atom species therein is provided. A chamber having a metallic outer shell and an inner insulative tube, is operated as a microwave resonant cavity, preferably having a diameter of about one quarter of the operating wavelength. A waveguide couples microwave energy from a source to a slot cut into the metallic outer shell of the cavity. Microwave energy passes through the inner energy transparent tube and excites reactant gases supplied from an input tube. Plasma is conducted from the cavity by a plasma output tube coupled into a processing chamber and controlled pressure pumping system.

REFERENCES:
patent: 4699689 (1987-10-01), Bersin
patent: 4988644 (1991-01-01), Jucha et al.
patent: 5262610 (1993-11-01), Huang et al.
patent: 5453125 (1995-09-01), Krogh
patent: 5747917 (1998-05-01), Hercher

Affiliated with

Also associated with

Rating

Resonant chamber applicator for remote plasma source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Resonant chamber applicator for remote plasma source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resonant chamber applicator for remote plasma source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-243620