Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1991-09-04
1993-07-13
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430156, 430165, 430166, 430192, 430270, 430326, G03C 152, G03C 516
Patent
active
052272800
ABSTRACT:
A PMGI bilayer resist for integrated circuit fabrication having increased sensitivity to light and formed by the addition of cyclic anhydrides to the resist and the formation of an accompanying bilayer resist structure of a portable conforming mask having a desirable undercut profile for lift-off of patterned metallic circuitry.
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Jubinsky James A.
Katz Steven M.
Lyons Christopher F.
Moreau Wayne M.
Bowers Jr. Charles L.
Crockatt Dale M.
Huff Mark F.
International Business Machines - Corporation
Stemwedel John A.
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