Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2005-12-19
2009-06-02
Duda, Kathleen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S325000, C430S330000
Reexamination Certificate
active
07541137
ABSTRACT:
Methods for increasing the resolution capability and line edge roughness of resists, including chemically amplified resists are disclosed. In order to improve upon the resolution, dipolar species may be coupled to a photoacid group and/or added to the resist, where the dipolar species may influence the direction of acid diffusion. An electric field may be applied to a post-exposure bake process and/or a soft bake process and the resist layer is developed.
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patent: WO 2004/057425 (2004-07-01), None
patent: WO 2005038527 (2005-04-01), None
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PCT International Search Report, issued in International Application No. PCT/US2006/062308, dated Oct. 1, 2007.
Duda Kathleen
Fulbright & Jaworski LLP
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