Resist processing method and apparatus

Details Resist processing method and apparatus Resist processing method and apparatus

1997-11-05

1998-12-29

Bell, Janyce

Coating processes

Centrifugal force utilized

427336, 4273855, B05D 312

Patent

active

058538038

ABSTRACT:
A method of resist-processing a rectangular substrate including a resist coating step of supplying resist solution to the substrate, while rotating it, to form resist film at least on one surface of it and a resist removing step of jetting removing liquid, which can solve resist, to both surfaces of it at its side peripheral portions to remove the resist film from them.

REFERENCES:
patent: 5180431 (1993-01-01), Sugimoto et al.
patent: 5349978 (1994-09-01), Sago et al.
patent: 5351360 (1994-10-01), Suzuki et al.
patent: 5403397 (1995-04-01), Beckers et al.
patent: 5439519 (1995-08-01), Sago et al.
patent: 5454371 (1995-10-01), Liaw et al.

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