4. Coating processes
  5. Centrifugal force utilized

Kazuki Denpoh

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Apparatus and method for plasma treatment

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Apparatus and method for plasma treatment

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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Method of plasma particle simulation, storage medium, plasma...

Radiant energy – Ionic separation or analysis – Cyclically varying ion selecting field means
Reexamination Certificate

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Resist processing apparatus for a rectangular substrate

Coating apparatus – With means to centrifuge work
Patent

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Resist processing method and apparatus

Coating processes – Centrifugal force utilized
Patent

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Profile ID: LFUS-PAI-P-1454907

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