Resist pattern forming method

Details Resist pattern forming method Resist pattern forming method

2011-07-12

2011-07-12

Duda, Kathleen (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

Reexamination Certificate

active

07977036

ABSTRACT:
A fine and high-accuracy resist pattern, which is excellent in etching resistance, can be formed. Disclosed is a resist pattern forming method, which includes the steps of developing a resist composition having photosensitivity to a predetermined light source through a lithography technique to form a resist pattern2on a substrate1, and bringing the resist pattern2into contact with a supercritical processing solution5′including a supercritical fluid3′which contains a crosslinking agent4.

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