Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1996-10-15
1998-04-21
Lesmes, George F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430325, 4302701, G03C 500
Patent
active
057416290
ABSTRACT:
Polymers suitable for chemically amplified resists based on styrene chemistry are advantageously formed with a meta substituent on the phenyl ring of the styrene moiety. Additionally, polymers for such applications including, but not limited to, meta substituted polymers are advantageously formed by reacting a first monomer having a first protective group with a second monomer having a second protective group. After polymerization, the second protective group is removed without substantially affecting the first protective group. For example, if the first protective group is an alkoxy carbonyl group, and the second protective group is a silyl ether group, treatment with a lower alcohol with trace amounts of acid transforms the silyl group into an OH-moiety without affecting the alkoxy carbonyl group.
REFERENCES:
patent: 4808511 (1989-02-01), Holmes
patent: 4996136 (1991-02-01), Houlihan et al.
Takumi Ueno et al. "Chemical amplification positive resist Systems using novel Sulfonates as acid generators," Polym. Microelectron. Proc. Int. Symp. (1990). Meeting date 1989, pp. 413-424.
Hiroshi Ito et al. "Effects of polymer end groups on Chemical amplification", SPIE vol. 1672 Advances in Resist Technology and Processing, Mar. 9-10, 1992, pp. 1-14.
Chandross Edwin Arthur
Kometani Janet Mihoko
Nalamasu Omkaram
Reichmanis Elsa
Uhrich Kathryn Elizabeth
Lesmes George F.
Lucent Technologies - Inc.
Schneider Bruce S.
Weiner Laura
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