Resist materials and processes of their use

Details Resist materials and processes of their use Resist materials and processes of their use

1993-05-11

1994-12-20

Rodee, Christopher D.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430326, 430270, 430921, G03F 7004

Patent

active

053745043

ABSTRACT:
Resist materials sensitive to actinic radiation are formed from an acid generator and a material sensitive to acid. The acid from the acid generator interacts with the acid sensitive material to produce a change in solubility. Particularly useful acid generators included benzyl and naphthylmethyl sulfones.

REFERENCES:
patent: 3615467 (1971-10-01), Poot et al.
patent: 3779778 (1973-12-01), Smith et al.
patent: 4708925 (1987-11-01), Newman
patent: 4996136 (1991-02-01), Houlihan et al.
Lin, B. J., Journal of Vacuum Science and Technology, vol. 12, p. 1317 (1975).

Affiliated with

Also associated with

Rating

Resist materials and processes of their use does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Resist materials and processes of their use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resist materials and processes of their use will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2385575