Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1990-07-31
1991-11-19
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430967, 430330, 430326, 430313, 430325, 430323, 430270, 156643, G03F 7039, G03F 732, G03F 736
Patent
active
050665669
ABSTRACT:
A one component resist material useful for deep ultraviolet, x-ray, and electron radiation has been found. Such material involves a substituent that is sensitive to acid and a moiety in the chain which both induces scission and provides an acid functionally upon such scission.
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Tarascon et al., "Poly(tert-butoxycarbonylstyrene Sulfone)-Based Chemically Amplified Resists for Deep-UV Lithography", from Chemical Abstracts, vol. 111, No. 164013t, Citing Polym Eng. Sci., 1989, vol. 29, No. 13, pp. 850-855.
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AT&T Bell Laboratories
Hamilton Cynthia
Schneider B. S.
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