Resist materials

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

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430270, 430313, 430 5, G03C 558

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active

051358387

ABSTRACT:
A class of resist compositions sensitive to deep ultraviolet radiation includes a resin sensitive to acid and a composition that generates acid upon exposure to such radiation. A group of nitrobenzyl materials is particularly suitable for use as the acid generator.

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Macromolecules; vol. 21, No. 7; Jul. 1988; F. M. Houlihan et al.; pp. 2001-2006; Nitrobenzyl Ester Chemistry for Polymer Processes Involving Chemical Amplification.
"Substituent Constants for Correlation Analysis in Chemistry and Biology" Wiley Interscience (1979).
"Steric Effects in Organic Chemistry," Taft, edited by Melvin Newman, Wiley & Son, p. 595 (1956).
"Semiconductor Lithography", Plenum Press, New York, N.Y., Chapters 12 and 13.

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