Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1990-08-09
1992-08-04
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430270, 430313, 430 5, G03C 558
Patent
active
051358387
ABSTRACT:
A class of resist compositions sensitive to deep ultraviolet radiation includes a resin sensitive to acid and a composition that generates acid upon exposure to such radiation. A group of nitrobenzyl materials is particularly suitable for use as the acid generator.
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Houlihan Francis M.
Neenan Thomas X.
Reichmanis Elsa
AT&T Bell Laboratories
McCamish Marion E.
Rodee Christopher D.
Schneider B. S.
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