Resist material for micro-fabrication with unsaturated dicarboxy

Details Resist material for micro-fabrication with unsaturated dicarboxy Resist material for micro-fabrication with unsaturated dicarboxy

1978-07-19

1981-06-16

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430281, 430287, 430313, 430323, 430325, 430942, 430967, 20415915, 20415919, G03C 500

Patent

active

042738580

ABSTRACT:
A resist material for micro-fabrication comprising a polymer in which the polymer backbone has thereon a moiety of the formula (I) ##STR1## wherein R represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group or an aralkyl group, the resist material being curable by electromagnetic radiation such as electron beams, X-rays or deep ultraviolet light with a wave length of less than about 3000A and being particularly suitable as a micro-fabrication resist material.

REFERENCES:
patent: 3367992 (1968-02-01), Bearden
patent: 3647520 (1972-03-01), Gor et al.
patent: 3697351 (1972-10-01), Harmer et al.
patent: 3703402 (1972-11-01), Cole
patent: 3720592 (1973-03-01), Mani
patent: 3881935 (1975-05-01), Apellaniz
patent: 3933746 (1976-01-01), Steele
patent: 4001462 (1977-01-01), Blin et al.
patent: 4020233 (1977-04-01), Morgan
patent: 4022927 (1977-05-01), Pfeiffer et al.
patent: 4059480 (1977-11-01), Ruh et al.
patent: 4108844 (1978-08-01), Kawai

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