Resist film developing method and an apparatus for carrying out

Details Resist film developing method and an apparatus for carrying out Resist film developing method and an apparatus for carrying out

1992-06-04

1994-08-30

Kight, III, John

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430396, 430329, 430330, 430397, 156646, G03C 500

Patent

active

053427386

ABSTRACT:
Disclosed is herein a method of developing an exposed resist film formed over a major surface of a substrate, the method comprising: holding the substrate carrying the resist film in contact with the supporting surface of a supporting member, having an area smaller than the surface area of the substrate, and supplying a developer onto the resist film so that the developer is retained in a developer puddle by surface tension on the surface of the resist film to develop the resist film, wherein the substrate carrying the resist film is separated from the supporting member during the progress of the development of the resist film.

REFERENCES:
patent: 4851311 (1989-07-01), Millis et al.

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