Resist composition with radiation sensitive acid generator

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430325, 430326, 430921, 430925, G03F 7004, G03F 730

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active

061656739

ABSTRACT:
The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.

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T. I. Wallow et al., "Evaluation of Cycloolefin-Maleic Anhydride Alternating Copolymers as Single-Layer Photoresists for 193 nm Photolithography", SPIE vol. 2724 (1996).
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