Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-04-19
2011-04-19
Lee, Sin J. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S910000, C430S914000, C430S921000, C430S922000, C430S923000, C430S924000, C549S300000, C549S318000, C549S320000, C549S459000, C549S473000
Reexamination Certificate
active
07927780
ABSTRACT:
A compound represented by formula (I); and a compound represented by formula (b1-1):wherein X represents —O—, —S—, —O—R3— or —S—R4—, wherein each of R3and R4independently represents an alkylene group of 1 to 5 carbon atoms; R2represents an alkyl group of 1 to 6 carbon atoms, an alkoxy group of 1 to 6 carbon atoms, a halogenated alkyl group of 1 to 6 carbon atoms, a halogen atom, a hydroxyalkyl group of 1 to 6 carbon atoms, a hydroxyl group or a cyano group; a represents an integer of 0 to 2; Q1represents an alkylene group of 1 to 12 carbon atoms or a single bond; Y1represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group; M+represents an alkali metal ion; and A+represents an organic cation.
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Notice of Allowance issued in counterpart Korean Patent Application No. 10-2008-0088820, dated Mar. 30, 2010.
Notice of Allowance issued in counterpart Korean Patent Application No. 10-2008-0088820, dated Mar. 30, 2010.
Hada Hideo
Hidesaka Shinichi
Iwai Takeshi
Kawaue Akiya
Kurosawa Tsuyoshi
Knobbe Martens Olson & Bear LLP
Lee Sin J.
Tokyo Ohka Kogyo Co. Ltd.
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