Resist composition, method of forming resist pattern,...

Details Resist composition, method of forming resist pattern,... Resist composition, method of forming resist pattern,...

2008-04-01

2009-02-10

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S910000, C430S922000

Reexamination Certificate

active

07488568

ABSTRACT:
A resist composition including a base component (A) and an acid-generator component (B), the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1-8) shown below (wherein R401represents an acid dissociable, dissolution inhibiting group; R41to R43each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxy group or a hydroxyalkyl group; Q represents a divalent linking group or a single bond; and X−represents an anion) or an acid generator (B1′) including a compound represented by general formula (b1-9) shown below (wherein R402and R403each independently represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R404represents an alkyl group or a halogenated alkyl group, wherein R403and R404may be bonded to each other to form a ring structure; and X−represents an anion).

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