Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2005-09-01
2010-06-15
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S330000, C430S919000, C430S920000, C430S921000, C430S905000, C430S910000, C430S925000, C430S942000
Reexamination Certificate
active
07736842
ABSTRACT:
A resist composition for electron beam or extreme ultraviolet (EUV), comprising a resin component (A) which exhibits changed alkali solubility under action of acid, and a photoacid generator component (B) that generates acid on exposure,wherein the component (B) comprises at least one onium salt selected from the group consisting of onium salts having an anion represented by formula (b-0-1) or (b-0-2) shown below:wherein X represents an alkylene group having 2 to 6 carbon atoms, in which at least one hydrogen atom is substituted with a fluorine atom; and each of Y and Z independently represents an alkyl group having 1 to 10 atoms, in which at least one hydrogen atom is substituted with a fluorine atom.
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Date-stamped enclosure letter with the European Search Report.
Hada Hideo
Kinoshita Hiroo
Shiono Daiju
Watanabe Takeo
Knobbe Martens Olson & Bear LLP
Lee Sin J.
Tokyo Ohka Kogyo Co. Ltd.
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