Resist composition and method for forming a pattern using...

Details Resist composition and method for forming a pattern using... Resist composition and method for forming a pattern using...

2009-01-30

2011-11-08

Walke, Amanda C. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S286100, C430S311000, C430S317000, C430S318000, C430S330000, C430S331000, C430S913000, C430S927000

Reexamination Certificate

active

08053164

ABSTRACT:
The present invention relates to a resist composition with a hardener and a solvent, and a method for forming a pattern using the resist composition. The hardener has a thermal-decomposable core part, and a first photosensitive bond art. The solvent has a low-molecular resin, and a second photosensitive bond part.

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English language machine translation pf JP 2003-221420 (no date).
Machine translation of JP 2003-221420 (no date).

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