Resist coating film

Details Resist coating film Resist coating film

1997-01-28

1999-11-09

Nuzzolillo, Maria

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430921, G03C 173

Patent

active

059811463

ABSTRACT:
When a fine pattern is formed by using a chemical-amplification-type resist film, fall of acid in the surface of the resist can be inhibited so that a fine pattern exhibiting an excellent shape is formed. A resist coating film containing a compound having a sulfonic acid group or a carbonic acid group is formed on a chemical-amplification-type resist film of a semiconductor substrate, followed by performing exposure.

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MacDonald et al., "Airborne Chemical Contamination Of A Chemically Amplified Resist", SPIE vol. 1466 Advances in Resist Technology and Processing 1991, pp. 2-12.
Neenan et al. "Chemically Amplified Resists: A Lithographic Comparison Of Acid Generating Species", SPIE vol. 1086 Advances In Resist Technology And Processing V1 (1989), pp. 2-10.

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