Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-08-09
2005-08-09
Thornton, Yvette C. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S286100, C430S905000, C430S910000, C430S326000, C526S270000
Reexamination Certificate
active
06927011
ABSTRACT:
A resist resin containing a monomer unit selected from the group comprising a monomer unit represented by Formula (II):wherein a substituent R3represents an alkyl group, or a functional group comprising an acid-deprotectable protecting group, m representing the number of R3is 0 (non-substitution), 1, 2 or more, R3may be different from each other, provided that m is 2 or more, and n represents an integer of 0 to 4, has no rough spots on the surface after etching and so has good dry etching resistance, and therefore the resist resin is preferably used as a photo resist for DUV.
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Fujiwara Tadayuki
Kamon Yoshihiro
Momose Hikaru
Murata Naoshi
Tokimitsu Toru
Mitsubishi Rayon Co. Ltd.
Thornton Yvette C.
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