REMA objective for microlithographic projection exposure systems

Details REMA objective for microlithographic projection exposure systems REMA objective for microlithographic projection exposure systems

1996-12-23

1999-11-09

Epps, Georgia

Optical: systems and elements

Lens

With field curvature shaping

359656, 359661, 359726, G02B 300, G02B 2102, G02B 1700

Patent

active

059825588

ABSTRACT:
A REMA objective 123 images an object plane 1 onto the reticle plane 33 and has a lens group 300 disposed in the half of the objective close to the reticle. The object plane 1 lies at a finite spacing. In the lens group 300, the principal ray elevations are greater in magnitude than the elevations of the peripheral rays. A scattering surface 28 is arranged in the lens group 300 having a largest magnitude of sine of the angle of incidence of the principal ray in air with respect to the surface normal (.vertline.sin (i.sub.princ).vertline.) greater than 0.35 and preferably greater than 0.5.

REFERENCES:
patent: 4929071 (1990-05-01), Mercado
patent: 5170207 (1992-12-01), Tezuka et al.
patent: 5559637 (1996-09-01), Moskovich
patent: 5646715 (1997-07-01), Wangler
patent: 5675401 (1997-10-01), Wangler et al.
patent: 5677797 (1997-10-01), Betensky
patent: 5742436 (1998-04-01), Furter
patent: 5805344 (1998-09-01), Sesaya et al.

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