Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2007-08-07
2007-08-07
Geyer, Scott B. (Department: 2812)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C257SE21206
Reexamination Certificate
active
11063152
ABSTRACT:
The present invention relates to methods of improving the fabrication of interconnect structures of the single or dual damascene type, in which there is no problem of hard mask retention or of conductivity between the metal lines after fabrication. The methods of the present invention include at least steps of chemical mechanical polishing and UV exposure or chemical repair treatment which steps improve the reliability of the interconnect structure formed. The present invention also relates to an interconnect structure which include a porous ultra low k dielectric of the SiCOH type in which the surface layer thereof has been modified so as to form a gradient layer that has both a density gradient and a C content gradient.
REFERENCES:
patent: 6441491 (2002-08-01), Grill et al.
patent: 2005/0156285 (2005-07-01), Gates et al.
Dimitrakopoulos Christos D.
Gates Stephen M.
McGahay Vincent J.
Mehta Sanjay C.
Geyer Scott B.
Scully , Scott, Murphy & Presser, P.C.
Trepp, Esq. Robert M.
Ullah Elias
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