Refractive projection objective

Details Refractive projection objective Refractive projection objective

2007-03-13

2007-03-13

Mack, Ricky L. (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C359S754000, C355S067000

Reexamination Certificate

active

10931051

ABSTRACT:
Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8<D1/D2<1.1.

REFERENCES:
patent: 5636066 (1997-06-01), Takahashi
patent: 6097537 (2000-08-01), Takahashi et al.
patent: 6198576 (2001-03-01), Matsuyama
patent: 6349005 (2002-02-01), Schuster et al.
patent: 6538821 (2003-03-01), Takahashi
patent: 6556353 (2003-04-01), Omura
patent: 6560031 (2003-05-01), Shafer et al.
patent: 6606144 (2003-08-01), Omura
patent: 6700645 (2004-03-01), Shigematsu
patent: 6791761 (2004-09-01), Shafer et al.
patent: 2001/0050820 (2001-12-01), Shafer et al.
patent: 2002/0001141 (2002-01-01), Shafer et al.
patent: 2002/0005938 (2002-01-01), Omura
patent: 2002/0197946 (2002-12-01), Emami et al.
patent: 2004/0004757 (2004-01-01), Schuster
patent: 2004/0120051 (2004-06-01), Schuster et al.
patent: 2004/0201899 (2004-10-01), Shafer et al.
patent: 198 18 444 (1998-10-01), None
patent: 198 55 108 (2000-05-01), None
patent: 102 10 899 (2003-09-01), None
patent: 102 24 361 (2003-11-01), None
patent: 0 816 892 (1998-01-01), None
patent: 1 006 387 (2000-06-01), None
patent: 1 061 396 (2000-12-01), None
patent: 1 111 425 (2001-06-01), None
patent: 1 139 138 (2001-10-01), None
patent: 1 191 378 (2002-03-01), None
patent: 103 25 922 (1998-12-01), None
patent: 0 770 895 (1997-05-01), None
patent: WO 01/04682 (2001-01-01), None
patent: WO 01/23933 (2001-04-01), None
patent: WO 01/23935 (2001-04-01), None
patent: WO 01/50171 (2001-07-01), None
patent: WO 02/082159 (2002-10-01), None
patent: WO 02/103431 (2002-12-01), None
patent: WO 03/036361 (2003-05-01), None
patent: WO 03/052462 (2003-06-01), None
patent: WO 03/075097 (2003-09-01), None
patent: WO 03/077036 (2003-09-01), None
patent: WO 03/077037 (2003-09-01), None
patent: WO 03/093904 (2003-11-01), None
patent: WO 2004/019128 (2004-03-01), None
M. Switkes and M. Rothchild, Immersion lithography at 157 nm. J. Vac. Sci. Technol. B. Nov./Dec. 2001, pp. 2353-2356, vol. 19, No. 6.
John H. Bruning, Optical Lithography—Thirty years and three orders of magnitude, SPIE, pp. 14-27, vol. 3049.
Jere D. Buckley and Charles Karatzas, Step and scan: A systems overview of a new lithography tool, SPIE—Optical/Laser Microlithography II, 1989, pp. 424-433, vol. 1088.
Bruce W. Smith, Optics for Photolithography—Optical System Design, Microlithography: Science and Technology, 1998, pp. 263-264.
Walter Wöltche, Optical systems design with reference to the evolution of the double Gauss lens, SPIE-International Lens Design Conference (OSA), 1980, pp. 202-215, vol. 237.
Erhard Glatzel, New Lenses for Microlithography, Zeiss-Inform., 1981/1982, pp. 8-13, vol. 26, No. 92 E, Oberkochen, Germany.
Erhard Glatzel, New Developments in Photographic Objectives, pp. 407-428.

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