Reflection type photomask and reflection type photolithography m

Details Reflection type photomask and reflection type photolithography m Reflection type photomask and reflection type photolithography m

1992-10-22

1994-08-16

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430 5, G03C 500

Patent

active

053386477

ABSTRACT:
A reflection type photomask includes a substrate, and a reflecting surface formed on the substrate and including a first region and a second region which have a relative height difference. Due to the concavo-convex structure of the reflecting surface, a light reflected from the first region and a light reflected from the second region have a predetermined phase difference which may be used effectively to form a pattern on a photoresist layer.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto

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