Reflection preventing film and process for forming resist patter

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

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430326, 430327, 430330, 430510, 526266, 526273, 5263171, 5263185, 5263186, G03F 726, G03F 709

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active

055254578

ABSTRACT:
A reflection preventing film for forming a resist pattern and a process for forming the resist pattern using the film. The film comprises a copolymer was copolymerized of monomers which comprise at least one unsaturated carboxylic acid monomer, at least one epoxy group-containing unsaturated monomer, and at least one cinnamoylphenyl group-containing unsaturated monomer. The reflection preventing film exhibits a high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, is free from occurrence of intermixing, possesses excellent heat resistance, exhibits a superb dry etching performance and storage stability, and produces resist patterns with excellent resolution and precision. The resist pattern forming process comprises forming the reflection preventing film on a substrate, forming a resist coating film on said reflection preventing film, irradiating the resist film with a radiation, and developing the resist coating film.

REFERENCES:
patent: 5085975 (1992-02-01), Mueller
patent: 5397684 (1995-03-01), Hogan et al.
patent: 5401614 (1995-03-01), Dichiara et al.
patent: 5410005 (1995-04-01), Nemoto et al.

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