Reflecting device for electromagnetic waves

Optical: systems and elements – Mirror – With support

Reexamination Certificate

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C359S359000, C359S584000, C204S192340

Reexamination Certificate

active

07077533

ABSTRACT:
A device serves for reflecting electromagnetic waves, in particular in a length range less than 200 nm. It has a mirror carrier made of a material with at least approximately vanishing thermal expansion and at least one reflective layer applied on said mirror carrier. An intermediate layer made of a material which is formed such that its surface roughness is not significantly increased after beam processing methods is fitted between the mirror carrier and the reflective layer.

REFERENCES:
patent: 5948468 (1999-09-01), Sweatt et al.
patent: 6295164 (2001-09-01), Murakami et al.
patent: 6368942 (2002-04-01), Cardinale
patent: 6377655 (2002-04-01), Murakami et al.
patent: 6387572 (2002-05-01), Tong et al.
patent: 6776006 (2004-08-01), Best et al.
patent: 6849859 (2005-02-01), Folta et al.
patent: 2001/0028518 (2001-10-01), Kaiser
patent: 0 955 565 (1999-11-01), None
E. Spiller, et al., “Normal Incidence Optics for Solar Coronal Imaging”, SPIE vol. 2515, pp. 136-145, Jun. 1995.
Chuck Gwyn, et al. “EUV Lithography NGL Technology Review”, EUV Lithography Program NGL Workshop, Chicago, Illinois, Jun. 9, 1999.
P. Gailly, et al., “Ion Beam Figuring of small BK7 and Zerodur optics: thermal effects”, SPIE vol. 3739, pp. 124-131, May 1999.
W.M. Tong, et al., “Mask substrate requirements and development for extreme ultraviolet lithography (EUVL)”, SPIE vol. 3873, pp. 421-428, Dec. 1999.
U. Dinger, et al., “Mirror substrates for EUV-lithography: progress in metrology and optical fabrication technology”, SPIE vol. 4146, pp. 35-46, Nov. 2000.
M. Fruit, et al., “Ion Beam Figuring of SIC Mirrors Provides Ultimate WFE Performances for Any Type of Telescope”, SPIE vol. 3739, pp. 412-154, Sep. 1999.
C.M. Egert, et al., “Roughness Evolution of Optical Materials Induced by Ion Beam Milling”, SPIE vol. 1752, pp. 63-72, Dec. 1992.
P.B. Mirkarimi, et al., “Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme ultraviolet lithography applications” UCRL-JC-128293 (Preprint), Feb. 1998.
H.-J. Stock, et al., “Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum/silicon multilayer soft-x-ray mirrors” Appl. Optics vol. 36, No. 7, Mar. 1, 1997, pp. 1650-1654.
P.B. Mirkarimi, et al “Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography”, Appl. Optics, vol. 39, No. 10, Apr. 1, 2000, pp. 1617-1625.
P.B. Mirkarimi, et al “Recovery of multilayer-coated Zerodur and ULE optics for extreme-ultraviolet lithography by recoating, reactive ion-etching, and wet-chemical processes” Appl. Optics, vol. 40, No. 1, Jan. 2001, pp. 62-70.

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