Reference data generating method, pattern defect checking...

Details Reference data generating method, pattern defect checking... Reference data generating method, pattern defect checking...

2004-12-29

2009-10-13

Ahmed, Samir A. (Department: 2624)

Image analysis

Applications

Manufacturing or product inspection

C382S144000

Reexamination Certificate

active

07602961

ABSTRACT:
A method of generating reference data is disclosed, in which two-value or multi-value gradated data of pixels is obtained in units of pixels from a design data of a pattern to be formed on an object, a processed data is obtained by carrying out calculations to the gradated data, and a reference data for use in a comparison with a sensed data obtained by image-picking up a pattern formed on the object is obtained based on the processed data, the method comprising carrying out a first calculation including a predetermined parameter to a value of an gradated data of a targeted pixel among the pixels to obtain a first processed data, and carrying out a second calculation including a predetermined parameter to the values of the gradated data of the targeted pixel and pixels located at the periphery of the targeted pixel to obtain a second processed data.

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Yoshikawa, R. et al., “257nm Wavelength Mask Inspection for 62nm Node Reticles”, Digest of Papers Photomask Japan 2004, pp. 73-74, (2004).
Notification of Reasons for Rejection from the Japanese Patent Office, mailed Oct. 31, 2006, in Japanese Patent Application No. 2004-000516, and English translation thereof.

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