Reduction in damage to optical elements used in optical lithogra

Details Reduction in damage to optical elements used in optical lithogra Reduction in damage to optical elements used in optical lithogra

1996-01-16

1999-04-06

Nuzzolillo, Maria

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430311, 2504921, 2504923, G03C 500

Patent

active

058916059

ABSTRACT:
An optical lithographic process and system for fabricating devices which includes an optical subsystem for reducing the rate of damage to the system's optics caused by exposure to energy pulses from an exposure source. The optical subsystem transforms a primary energy pulse from the exposure source into N secondary pulses, where N is .gtoreq.2 with a delay provided between each secondary pulse so as to reduce the peak intensity of the energy pulse being transmitted through the optical system. The subsystem redirects the secondary pulses spatially to satisfy source requirements for appropriate lithographic illuminators. Furthermore, the subsystem may be an intrinsic design feature of the illuminator or exposure source.

REFERENCES:
patent: 3447856 (1969-06-01), De Lange
patent: 5003543 (1991-03-01), Morsell et al.
patent: 5005969 (1991-04-01), Katoaka
patent: 5089711 (1992-02-01), Morsell et al.
patent: 5491534 (1996-02-01), Shiozawa

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