Reducing the liquid solvent development time of a polymeric reli

Details Reducing the liquid solvent development time of a polymeric reli Reducing the liquid solvent development time of a polymeric reli

1982-06-28

1983-08-09

Powell, William A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

156646, 156651, 156654, 156668, 427 431, 430434, B44C 122, C03C 1500, C03C 2506, B29C 1708

Patent

active

043979408

ABSTRACT:
The present invention contemplates a method to reduce the liquid solvent contact time required to develop a latent polymeric relief image in a layer of polymeric material that is selectively exposed to radiation so that there is formed a layer having exposed and unexposed areas. In the method of the present invention, the layer is exposed to the gaseous vapors of at least one solvent for the more soluble area, after which it is contacted with a liquid solvent which preferentially dissolves the material from the more soluble area and which does not affect the polymerized material which forms the relief image.

REFERENCES:
patent: 2732286 (1956-01-01), Propstl
patent: 3794487 (1974-02-01), Rohrig et al.
patent: 3824137 (1974-07-01), Bok et al.

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