Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2005-04-26
2005-04-26
Lund, Jeffrie R. (Department: 1763)
Coating apparatus
Gas or vapor deposition
C156S345290, C156S345330, C156S345340
Reexamination Certificate
active
06884296
ABSTRACT:
Reactors having gas distributors for depositing materials onto micro-device workpieces, systems that include such reactors, and methods for depositing materials onto micro-device workpieces are disclosed herein. In one embodiment, a reactor for depositing material on a micro-device workpiece includes a reaction chamber and a gas distributor in the reaction chamber. The gas distributor includes a first gas conduit having a first injector and a second gas conduit having a second injector. The first injector projects a first gas flow along a first vector and the second injector projects a second gas flow along a second vector that intersects the first vector in an external mixing zone facing the workpiece. In another embodiment, the mixing zone is an external mixing recess on a surface of the gas distributor that faces the workpiece.
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Basceri Cem
Sandhu Gurtej S.
Lund Jeffrie R.
Micro)n Technology, Inc.
Perkins Coie LLP
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